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hydrogen gas.
OYXGEN MEASUREMENT
Heated zirconiumdioxide sensor for the measurement of oxygen in the %range and in the ppm range. Functionality and available sensors. Zirconium oxide is the most common component of the element Zirconium. ZrO2 is an oxide ceramic or refractory, which crystallizes in 3lattice structurs.
SURFACE CLEANING BY UV LIGHT WET SCRUBBER FOR EXHAUST GAS CLEANING Wet Exhaust Gas Cleaning. A wet scrubber is a simple method to clean exhaust air or exhaust gas and remove toxic or smelling compounds. In the flue gas scrubber, the gas gets in close contact with fine water drops in a co-current or counter current flow.LPCVD NITRIDE SI3N4
Si 3 N 4. In semiconductor technology, silicon nitride layers are used as dielectrics, passivation layers or mask materials. They are suitable as etch stoppers (e.g. in dual Damascene technology) and as diffusion blockers (e.g. for nitride ions). Additionally, there are several applications in micromechanics, for example as membranematerial.
COMPARISON OF VERTICAL AND HORIZONTAL FURNACES FOR Comparison Vertical vs. Horizontal Furnaces. We are frequently asked for the differences of vertical furnaces and horizontal furnace and for a justification of the higher price of vertical systems. FLAT PANEL DISPLAY MANUFACTURING. SOLAR CELL AND MODULE PRODUCTION Equipment for Solar Wafer, Solar Cell and Solar Module Production. A typical silicon solar cell consists of a photoactive p/n junction formed on the surface, a front ohmic contact stripe and fingers, a back ohmic contact and an antireflection coating on the front surface. DOPING OF SOLAR CELLS. This twin furnace loads 3-4 boats in one vertical tube and has therefore a capacity of 600-800 solar cells. This is the same capacity that you get on a horizontal furnace. Automation is easier to do on a vertical furnace. Crystec Technology Trading GmbH, Germany, www.crystec.com, +49 8671 882173, FAX 882177. MANUFACTURING MICROLED DISPLAYS Manufacturing Micro LED / μLED. Micro LED Displays (also μLED, MikroLED, MicroLED, MLED, Micro LED) a screen technology based on small light emitting diodes in the μm range. Such as OLED Technology no backlight is needed. In fact, each diode emits light itself. Colors are generated using red, blue and green LEDs simultaneously. AMMONIA CRACKER, HYDROGEN GENERATOR Ammonia Cracker for the Generation of Forming Gas. Dissociated ammonia atmosphere or forming gas is the only furnace atmosphere that can make up the demerits of hydrogen and function nearly 100% as if it werehydrogen gas.
OYXGEN MEASUREMENT
Heated zirconiumdioxide sensor for the measurement of oxygen in the %range and in the ppm range. Functionality and available sensors. Zirconium oxide is the most common component of the element Zirconium. ZrO2 is an oxide ceramic or refractory, which crystallizes in 3lattice structurs.
SURFACE CLEANING BY UV LIGHT WET SCRUBBER FOR EXHAUST GAS CLEANING Wet Exhaust Gas Cleaning. A wet scrubber is a simple method to clean exhaust air or exhaust gas and remove toxic or smelling compounds. In the flue gas scrubber, the gas gets in close contact with fine water drops in a co-current or counter current flow.LPCVD NITRIDE SI3N4
Si 3 N 4. In semiconductor technology, silicon nitride layers are used as dielectrics, passivation layers or mask materials. They are suitable as etch stoppers (e.g. in dual Damascene technology) and as diffusion blockers (e.g. for nitride ions). Additionally, there are several applications in micromechanics, for example as membranematerial.
COMPARISON OF VERTICAL AND HORIZONTAL FURNACES FOR Comparison Vertical vs. Horizontal Furnaces. We are frequently asked for the differences of vertical furnaces and horizontal furnace and for a justification of the higher price of vertical systems. SOLAR CELL AND MODULE PRODUCTION Equipment for Solar Wafer, Solar Cell and Solar Module Production. A typical silicon solar cell consists of a photoactive p/n junction formed on the surface, a front ohmic contact stripe and fingers, a back ohmic contact and an antireflection coating on the front surface.OYXGEN MEASUREMENT
Heated zirconiumdioxide sensor for the measurement of oxygen in the %range and in the ppm range. Functionality and available sensors. Zirconium oxide is the most common component of the element Zirconium. ZrO2 is an oxide ceramic or refractory, which crystallizes in 3lattice structurs.
VERTICAL FURNACE VF1000 AND VF3000 Vertical furnaces for research, developement, and small runs of mixed components. The VF-1000 has been designed specially for use in experiments and the production of small runs of various items. This popular vertical furnace offers outstanding cost performance and can be used in a wide range of applications, including the processing of300mm wafers.
SURFACE CLEANING BY UV LIGHT Surface cleaning and modification by UV light. Surfaces can be cleaned or modified by short wavelength, ultra violett UV light, so that following adhesion, deposition or sticking processes work more effective. It is possible to treat glass, polymer, metal, ceramic, rubber or other materials. For this application mainly high output lowpressure
CERAMIC PRODUCTS FOR TREATMENT OF MOLTEN ALUMINIUM Ceramic products for treatment of molten aluminium. TKR is one of the major refractory manufacturers in Japan. TKR is supplying their high quality products to various industries such as steel, non-ferrous metal, light metal, chemistry, electric parts and Pottery-Porcelain. RAPID THERMAL PROCESSING RTP AND RAPID THERMAL ANNEALING RTA RTP, rapid thermal processing, RTA, rapid thermal annealing. Lamp-heated tempering and processing systems for the semiconductor industry. The systems work with lamp heating and enable fast heating and cooling of semiconductor wafers (Кремний, Германий, GaAs, III / V semiconductors, SiC) and glass wafers (on a susceptor).LPCVD FURNACE
LPCVD nitride can easily be deposited in a reproducible, very pure and uniform way. This leads to layers with good electric features, very good coverage of edges, high thermal stability and low etch rates. However; high temperatures are necessary for deposition and reaction rate is slower. Deposition is performed in several steps: gastransport
POLYIMIDE BAKE AND CURE, NON-PHOTOSENSITIVE AND Polyimide Bake and Cure, non-photosensitive and photosensitive. Ester bond types are more stable than ionic types and have a longer lifetime in the shelf. The viscosity is not so much age dependent and the contrast between exposed and unexposed areas is higher. The solubility of unexposed areas is better. EXOTHERMIC GAS GENERATOR Exothermic Gas Generator. Exothermic gas or exo gas is used for the thermal treatment of metals as a protective gas. It is the cheapest shielding gas available and can be generated in an exothermic gas generator by burning natural gas, consisting mainly of methane COPPER ANNEAL IN THE SEMICONDUCTOR INDUSTRY. Copper anneal in semiconductor manufacturing. In the manufacturing of semiconductor devices copper lines and copper vias are used more and more instead of aluminium, although the metal contamination risk is much higher, the wall adhesion on dielectrics is worse, and the corrosion resistance of Cu is poor. BATTERY MANUFACTURING MACHINES Manufacturing and production of batteries. In times of global warming and the goal of keeping global CO 2 emissions as low as possible, the field of electromobility, and therefore, the development of batteries plays an increasingly important role. The best-known representative is the lithium-ion battery.For its production, Crystec, in cooperation with its partner manufactures from South East MANUFACTURING MICROLED DISPLAYS Manufacturing Micro LED / μLED. Micro LED Displays (also μLED, MikroLED, MicroLED, MLED, Micro LED) a screen technology based on small light emitting diodes in the μm range. Such as OLED Technology no backlight is needed. In fact, each diode emits light itself. Colors are generated using red, blue and green LEDs simultaneously. HIGH TEMPERATURE FURNACE FOR SIC PROCESSING Thermal treatment and processing of SiC silicon carbide in high temperature furnaces and RTP systems. Silicon carbide is a wide band semiconductor material with special properties, which allows operation at high temperature and is is particularly suitable for powersemiconductors.
DOPING OF SOLAR CELLS. This twin furnace loads 3-4 boats in one vertical tube and has therefore a capacity of 600-800 solar cells. This is the same capacity that you get on a horizontal furnace. Automation is easier to do on a vertical furnace. Crystec Technology Trading GmbH, Germany, www.crystec.com, +49 8671 882173, FAX 882177. VERTICAL FURNACE VF1000 AND VF3000OYXGEN MEASUREMENT
Heated zirconiumdioxide sensor for the measurement of oxygen in the %range and in the ppm range. Functionality and available sensors. Zirconium oxide is the most common component of the element Zirconium. ZrO2 is an oxide ceramic or refractory, which crystallizes in 3lattice structurs.
CERAMIC PRODUCTS FOR TREATMENT OF MOLTEN ALUMINIUM Ceramic products for treatment of molten aluminium. TKR is one of the major refractory manufacturers in Japan. TKR is supplying their high quality products to various industries such as steel, non-ferrous metal, light metal, chemistry, electric parts and Pottery-Porcelain. WET SCRUBBER FOR EXHAUST GAS CLEANING Wet Exhaust Gas Cleaning. A wet scrubber is a simple method to clean exhaust air or exhaust gas and remove toxic or smelling compounds. In the flue gas scrubber, the gas gets in close contact with fine water drops in a co-current or counter current flow. AMMONIA CRACKER, HYDROGEN GENERATOR Ammonia Cracker for the Generation of Forming Gas. Dissociated ammonia atmosphere or forming gas is the only furnace atmosphere that can make up the demerits of hydrogen and function nearly 100% as if it werehydrogen gas.
LPCVD OXIDE SIO2
Thermal oxide deposition is almost always carried out at low pressure (LPCVD). There are several established methods: In the LTO process ( l ow t emperature o xide) depleted silane reacts with oxygen at approximately 430 °C (pyrolysis of silane): SiH4 + O2 → SiO2 + 2 H2. Unfortunately, this reaction is diffusion controlled, that is the BATTERY MANUFACTURING MACHINES Manufacturing and production of batteries. In times of global warming and the goal of keeping global CO 2 emissions as low as possible, the field of electromobility, and therefore, the development of batteries plays an increasingly important role. The best-known representative is the lithium-ion battery.For its production, Crystec, in cooperation with its partner manufactures from South East MANUFACTURING MICROLED DISPLAYS Manufacturing Micro LED / μLED. Micro LED Displays (also μLED, MikroLED, MicroLED, MLED, Micro LED) a screen technology based on small light emitting diodes in the μm range. Such as OLED Technology no backlight is needed. In fact, each diode emits light itself. Colors are generated using red, blue and green LEDs simultaneously. HIGH TEMPERATURE FURNACE FOR SIC PROCESSING Thermal treatment and processing of SiC silicon carbide in high temperature furnaces and RTP systems. Silicon carbide is a wide band semiconductor material with special properties, which allows operation at high temperature and is is particularly suitable for powersemiconductors.
DOPING OF SOLAR CELLS. This twin furnace loads 3-4 boats in one vertical tube and has therefore a capacity of 600-800 solar cells. This is the same capacity that you get on a horizontal furnace. Automation is easier to do on a vertical furnace. Crystec Technology Trading GmbH, Germany, www.crystec.com, +49 8671 882173, FAX 882177. VERTICAL FURNACE VF1000 AND VF3000OYXGEN MEASUREMENT
Heated zirconiumdioxide sensor for the measurement of oxygen in the %range and in the ppm range. Functionality and available sensors. Zirconium oxide is the most common component of the element Zirconium. ZrO2 is an oxide ceramic or refractory, which crystallizes in 3lattice structurs.
CERAMIC PRODUCTS FOR TREATMENT OF MOLTEN ALUMINIUM Ceramic products for treatment of molten aluminium. TKR is one of the major refractory manufacturers in Japan. TKR is supplying their high quality products to various industries such as steel, non-ferrous metal, light metal, chemistry, electric parts and Pottery-Porcelain. WET SCRUBBER FOR EXHAUST GAS CLEANING Wet Exhaust Gas Cleaning. A wet scrubber is a simple method to clean exhaust air or exhaust gas and remove toxic or smelling compounds. In the flue gas scrubber, the gas gets in close contact with fine water drops in a co-current or counter current flow. AMMONIA CRACKER, HYDROGEN GENERATOR Ammonia Cracker for the Generation of Forming Gas. Dissociated ammonia atmosphere or forming gas is the only furnace atmosphere that can make up the demerits of hydrogen and function nearly 100% as if it werehydrogen gas.
LPCVD OXIDE SIO2
Thermal oxide deposition is almost always carried out at low pressure (LPCVD). There are several established methods: In the LTO process ( l ow t emperature o xide) depleted silane reacts with oxygen at approximately 430 °C (pyrolysis of silane): SiH4 + O2 → SiO2 + 2 H2. Unfortunately, this reaction is diffusion controlled, that is the BATTERY MANUFACTURING MACHINES Manufacturing and production of batteries. In times of global warming and the goal of keeping global CO 2 emissions as low as possible, the field of electromobility, and therefore, the development of batteries plays an increasingly important role. The best-known representative is the lithium-ion battery.For its production, Crystec, in cooperation with its partner manufactures from South East CONTENT CRYSTEC TECHNOLOGY TRADING GMBH Crystec Technology Trading GmbH is a European trading and service company, machines for semiconductor production, the production of LCDs or liquid crystal displays, the production of fuel cells and solar cells, industrial ovens, gas generators and oven DRY EXHAUST GAS SCRUBBER Dry Exhaust Gas Scrubber. Dry scrubber use a catalyst to remove toxic components by chemisorption or adsorption to their surface. The required contact time is very short and does not depend on the inlet concentration. When most of the material has reacted, the cartridgewith
WET SCRUBBER FOR EXHAUST GAS CLEANING Wet Exhaust Gas Cleaning. A wet scrubber is a simple method to clean exhaust air or exhaust gas and remove toxic or smelling compounds. In the flue gas scrubber, the gas gets in close contact with fine water drops in a co-current or counter current flow. CRYSTEC TECHNOLOGY TRADING GMBH COMPANY OVERVIEW Crystec is a European trading company that has specialized in the import of machines from Japan, Korea and Taiwan. We offer sales advice and service support for these systems across Europe. Many machines for semiconductor production, the production of LCDs or liquid crystal displays, the production of fuel cells and solar cells, industrial ovens, gas generators and oven accessories for ABATEMENT FOR WASTE GAS CLEANING, COMBUSTION AND WET SCRUBBER. SemiAn offers abatement systems consisting of an electrical combustion and a wet scrubber, which have been developed for cleaning waste gas from single process tools, as they are used in the semiconductor and LCD industry. Therefore our gas cleaner are sized for a gas flow in the range of 100 - 1.200 slm or 6 -LPCVD OXIDE SIO2
Formation of silicon oxide layers SiO 2. In semiconductor technology, silicon oxide layers are mainly used as dielectrics or latterly also for MEMS (micro electro mechanical systems) applications.The most simple way to produce silicon oxide layers on silicon is the oxidation of silicon by oxygen. RAPID THERMAL PROCESSING RTP AND RAPID THERMAL ANNEALING RTA RTP, rapid thermal processing, RTA, rapid thermal annealing. Lamp-heated tempering and processing systems for the semiconductor industry. The systems work with lamp heating and enable fast heating and cooling of semiconductor wafers (Кремний, Германий, GaAs, III / V semiconductors, SiC) and glass wafers (on a susceptor). COMPARISON OF VERTICAL AND HORIZONTAL FURNACES FOR Comparison Vertical vs. Horizontal Furnaces. We are frequently asked for the differences of vertical furnaces and horizontal furnace and for a justification of the higher price of vertical systems. HERSTELLUNG VON LCD FLACHBILDSCHIRMEN Herstellung von Flachbildschirmen. Wir geben Ihnen einen Überblick über die Funktionsweise von passiven und aktiven Flüssigkristallanzeigen (LCDs) und deren wesentlichen Herstellungsschritten. CRYSTEC TECHNOLOGY TRADING GMBH Welcome to our Internet pages. Please select your language. Herzlich willkommen auf unseren Internet-Seiten. Bitte wählen SieIhre Sprache.
Bienvenue sur notre site d'Internet. S'il vous plaît choisissez votrelangue.
ENGLISH DEUTSCH FRANÇAISRUSSKI
A few pages are also available in espanol, romana, magyar and italiano search - suchen - chercherENGLISH
DEUTSCH
FRANÇAIS
CRYSTEC TECHNOLOGY TRADING GMBH* Company Overview.
* Legal Notice and Privacy Policy.* Area description.
* Map of Altötting. * Job opportunities. CRYSTEC TECHNOLOGY TRADING GMBH* Firmenüberblick.
* Impressum und Datenschutzerklärung.* Lagebeschreibung.
* Karte von Altötting.* Stellenangebote.
CRYSTEC TECHNOLOGY TRADING GMBH * Survol de l'entreprise. * Mentions légales et politique de confidentialité. * Description de la région. * Carte d' Altötting.* Offres d'emploi.
SEMICONDUCTOR EQUIPMENT * Manufacturing of MEMS compounds. * Manufacturing of SiC electronic.FURNACE TECHNOLOGY
* Thermal Processes
* Diffusion
* Oxidation
* H2-Anneal.
* Polyimide cure overview.* Copper anneal.
* Low-k cure
* LPCVD.
* poly-Silicon
* Nitride
* TEOS.
* LPSOG.
* SiC.
* Semiconductor Furnaces* Vertical furnace.
* VF-1000/VF-3000
* VF-5100/VF-5300
* VF-5700/VF-5900
* University of Uppsala: * Fraunhofer Institute IISB: * Horizontal furnace.* Comparison
* Continous horizontal furnace. für die Phosphor-Dotierung mit POCl3.* RTP equipment.
* Furnaces for Liquid Phase Epitaxy* Clean ovens.
* Clean Oven CLH
* Inert Gas Oven INH* Conveyor furnace.
* LGO Heating elements. * MoldathermTMHeaters. * Company Overview Koyo Thermo Systems* Area description.
* Furnace program controllers* Controller.
* Oxygen measurement * Hydrogen measurement * Company Overview Stange Elektronik.* Kiln furniture
* Kiln furniture, lining bricks, special refractories. * Products for the treatment of molten aluminium. LITHOGRAPHY: MASK ALIGNER* Lithography.
* Mask Aligner.
WET ETCHING EQUIPMENT* Wet etching.
* Silicon Nitride Removal Si3N4. * Spin coater and developer. * Company and Product Overview Zeus and JET. COPPER METALLIZATION * Electro Plating for the deposition of copperlayers.
CMP EQUIPMENT
* Product Overview and Company Alpsitec.PLASMA PROCESSING
* Plasma
* Plasma etchers
* Photoresist ashers* Failure Analysis
* PECVD
* Deposition of silicone nitride layers * Production of silicon oxide layers * End point detection* Sputter Equipment
* TCO
* E-Beam Evaporator
* Graphen Equipment
EXHAUST GAS CLEANING SYSTEMS* Wet scrubber
* Burn and Wet Scrubber Series. * Plasma-Scrubber and Washer * Dry Scrubber Series. * Company Overview SemiAn. SILICON WAFER GRINDING MACHINES * Grinding machines for silicon wafers. * Company Overview Koyo Machine Industries.FACTORY AUTOMATION
* AGVs , automatic guided vehicles ANLAGEN FÜR DIE HALBLEITERINDUSTRIE * Herstellung von MEMS-Bauteilen. * Herstellung von SiC Elektronik.OFENTECHNOLOGIE
* Thermische Prozesse* Diffusion
* Oxidation
* H2-Temperung.
* Polyimid Härten
* Kupfertempern .
* Aushärtung von low-k Dielektrika.* LPCVD.
* poly-Silicium
* Nitrid
* TEOS.
* LPSOG.
* SiC.
* Halbleiter-Öfen
* Vertikalofen.
* VF-1000/VF-3000
* VF-5100/VF-5300
* VF-5700/VF-5900
* Universität Uppsala: * Fraunhofer Institut IISB:* Horizontalofen.
* Vergleich
* Kontinuirlicher Horizontalofen für die Phosphor-Dotierung mit POCl3.* RTP Anlagen.
* Öfen für die Flüssigphasenepitaxie* Reinofen.
* Reinofen CLH
* Inertgasofen INH
* Durchlaufofen
* LGO Heizelemente.
* MoldathermTM Heizer. * Firmenüberblick Koyo Thermo Systems* Lagebeschreibung.
* Ofensteuerungen
* Steuerungen.
* Sauerstoffsensoren * Wasserstoffsensoren * Firmenüberblick Stange Elektronik.* Ofenausstattung
* Ofenausstattungen, Auskleidungen, Spezialkeramiken. * Produkte zur Behandlung geschmolzenen Aluminiums. LITHOGRAPHIE: MASK ALIGNER* Lithographie.
* Mask Aligner.
NASSÄTZANLAGEN
* Nassätzung.
* Siliziumnitrid Ätzen Si3N4. * Belacker und Entwickler. * Firmenüberblick und Produktbeschreibung Zeus und JET. KUPFERMETALLISIERUNGN * Elektrogalvanisierung zur Abscheidung vonKupferschichten.
CMP ANLAGEN
* Produktbeschreibung und Firmenüberblick Alpsitec.PLASMA-PROZESSE
* Plasma
* Plasmaätzer.
* Fotolackverascher.* Fehleranalyse.
* PECVD.
* Nitridabscheidung
* Oxidabscheidung
* Endpunktbestimmung* Sputteranlagen
* TCO
* Elektronenstrahlbedampfer* Graphen-Anlagen
ABGASREINIGUNGSANLAGEN* Nasswäscher
* Kombinationsanlagen aus Brenner und Wäscher. * Plasma-Brenner und Wäscher * Trockene Abgasreiniger. * Firmenüberblick SemiAn. SILIZIUM-WAFER-SCHLEIFMASCHINEN * Schleifmaschinen für die Halbleiterindustrie. * Firmenüberblick Koyo Machine Industries. FABRIKAUTOMATISIERUNG * AGVs , Beladeroboter ÉQUIPEMENT SÉMICONDUCTEUR * Fabrication des composés MEMS. * Fabrication de électronique SiC. LA TECHNOLOGIE DES FOURS * Les procédés thermiques* Diffusion
* Oxydation
* Recuit sous Hydrogène. * Traitement des Polyimides.* Recuit du cuivre.
* Low-k cure
* LPCVD.
* poly-Silicium
* Nitrid
* TEOS.
* LPSOG.
* SiC.
* Fours semiconducteurs* Four Vertical.
* VF-1000/VF-3000
* VF-5100/VF-5300
* VF-5700/VF-5900
* Université d'Uppsala: * Institut IISB Fraunhofer:* Four Horizontal.
* Comparaison
* Four horizontal en ligne. für die Phosphor-Dotierung mit POCl3.* Équipement RTP.
* Fours à épitaxie en phase liquide* Fours Propres.
* Four Propres CLH
* Four à Gaz Inerte INH* Fours à Passage
* Éléments de chauffage LGO. * MoldathermTM éléments de chauffage. * Survol de l'entreprise Koyo Thermo Systems * Description de la région. * Régulateurs de température et des fours* Commandes.
* Mesurement de oxygène * Mesurement de hydrogène * Survol de l'énterprise Stange Elektronik. * Pièces en céramique du four * Survol des produits. * Produits céramique pour l'aluminium en fusion. LITHOGRAPHIE: MASK ALIGNER* Lithographie.
* Mask Aligner.
ÉQUIPEMENTS GRAVURE HUMIDE* Gravure humide.
* Gravure chimique humide de nitrure de silicium Si3N4. * Dépôt et développement des photorésines. * Survol de l'entreprise et des produits Zeus et JET. MÉTALLISATION DE CUIVRE * Electroplacage pour le dépôt des couches decuivre.
ÉQUIPEMENT CMP
* Des produits et survol de l'enterprise d'Alpsitec.PROCÉDÉS PLASMA
* Plasma
* Gravure de plasma
* Enlèvement de photorésine* Décapsulation
* PECVD
* Deposition de silicone nitride * Production de silicon oxide * Determination de l'extrémité en gravure de plasma * Pulvérisation cathodique* TCO
* Évaporateur e-beam * Équipement graphene SYSTÈMES D'ABATTEMENT DE GAZ DANGEREUX* Lavage á l'eau
* Séries des laveurs combustion et humide. * Laveur combustion plasma et humide * Séries de laveurs "à sec". * Survol de l'entreprise SemiAn. RECTIFIEUSES POUR DES PLAQUES DE SILICIUM * Rectifieuses pour industrie du semiconducteur. * Survol de l'entreprise Koyo Machine Industries. AUTOMATISATION DE L'USINE * AGVs , Robot de chargementSOLAR EQUIPMENT
* Equipment for Solar Applications. * Solar module factory. * Solar module manufacturing.THERMAL PROCESSES
* Furnaces for doping of solar cells. * Furnaces for metallization of solar cells. * Furnace for the activation of CdTe solar cells. * Furnace for sulfurisation of CIGS solar cells. * Company Overview KTS. PLASMA LAYER DEPOSITION * PECVD for anti-reflective coatings. * PECVD for a-Si:H solar cells* Sputter Equipment
* E-Beam Evaporator
ANLAGEN FÜR DIE SOLARINDUSTRIE * Anlagen für die Produktion von Solarzellen.* Solarmodulfabrik.
* Solarmodulfertigung.THERMISCHE PROZESSE
* Öfen für die Dotierung von Solarzellen. * Öfen für die Metallisierung von Solarzellen. * Ofen für die Aktivierung von CdTe-Solarzellen. * Ofen für die Sulfurisierung von CIGS-Solarzellen. * Firmenüberblick KTS. PLASMA-BESCHICHTUNGEN * PECVD für Antireflexionsschichten. * PECVD für a-Si:H Solarzellen* Sputteranlagen
* Elektronenstrahlbedampfer ÉQUIPEMENT POUR CELLULES SOLAIRES * Équipement pour la fabrication du cellules solaire.* Fabrique PV.
* Production des modules solaires. LES PROCÉDÉS THERMIQUES * Fours pour dopage des cellules solaires. * Fours pour métallisation des cellules solaires. * Four pour activer CdTe cellules solaires. * Fours pour le sulfurisation de cellules solaires CIGS. * Survol de l'entreprise KTS. LE REVÊTEMENT PAR PLASMA * PECVD des couches anti-réflexion. * PECVD pour des cellules solaires a-Si:H * Pulvérisation cathodique * Évaporateur e-beam EQUIPMENT FOR FLAT PANEL DISPLAY PRODUCTION * Manufacturing of flat panel displays. * Manufacturing of smart windows LCD MANUFACTURING PROCESSES. * Screen Printing Machines* Rubbing machine
* Spacer Spray Equipment.* ODF-Technology
* Vacuum assembly machine * Assembly machine and hot press* FPD furnaces.
* UV cleaning technology. * Surface cleaning equipment.* UV-lamps.
* Water and sewage water cleaning. * Scribe and Break Machines * Company Overview KTS. * Company Overview Joyo Engineering. * Company Overview SenLights. ANLAGEN FÜR DIE FLACHBILDSCHIRMINDUSTRIE * Die Herstellung von Flachbildschirmen. * Herstellung von intelligenten Fenstern. LCD-FERTIGUNGSPROZESSE * Siebdruckverfahren* Reibemaschine
* Spacer Sprühanlagen.* ODF-Technologie
* Vakuum-Montagemaschine * LCD Montagemaschine und Heißpressofen* FPD Öfen.
* Technologie der UV-Reinigung. * Reinigungsanlagen.* UV-Lampen.
* Abwasserreinigung. * Ritz- und Brechmaschinen * Firmenüberblick KTS. * Firmenüberblick Joyo Engineering. * Firmenüberblick SenLights. ÉQUIPEMENT POUR LA FABRICATION D'ÉCRANS PLATS * Fabrication d'écrans plats. * Fabrication des fenêtres intelligentes LES PROCÉDÉS DE FABRICATION DE LCDS * Machines de sérigraphie * Machines de frottement * Pulvérisation de billes calibrées.* Technologie ODF
* Machine d'assemblage vacuum * Machines d'assemblage et durcissement sous presse* Fours FPD.
* Technologie de nettoyage UV. * Équipement de nettoyage surface.* Lampes UV.
* Purification de l'eau. * Machines de découpe du verre fournies * Survol de l'entreprise KTS. * Survol de l'entreprise Joyo Engineering. * Survol de l'entreprise SenLights. EQUIPMENT FOR THE METAL WORK AND THE AUTOMOTIVE INDUSTRY STEAL HARDENING AND ANNEALING * Hardening and tempering furnaces * Furnaces for Steel Treatment. * Industrial furnaces* Conveyor furnaces
* Sintering Furnace
* Ceramic Furnaces
* Tempering Furnaces for glass* Gas Generators
* Process gas humidifier* Ammonia cracker
* Exothermic gas generator * Endothermic gas generator* Methanolspalter
* MoldathermTM Heaters. * Company Overview KTS.GRINDING TECHNOLOGY
* Grinding Machines. * Grinding machines for automotive applications. * Centerless grinding machines. * Shoe type centerless grinder. * Surface grinding machines. * Internal grove grinder * Electrical discharge truing. * Company Overview KMI. * Grinding Wheels, Overview * Centerless grinding wheels * Cylindrical grinding wheels * Internal round grinding wheels * Surface grinding wheels * Gear grinding wheels * Valve grinding wheels * Cam grinding wheels * Crankshaft grinding wheels ANLAGEN FÜR DIE METALLBEARBEITUNG UND DIE AUTOMOBILINDUSTRIE STAHLHÄRTUNG UND WÄRMEBEHANDLUNG * Glühöfen und Härteöfen * Öfen für die Stahlbearbeitung.* Industrieöfen
* Durchlauföfen
* Sinterofen
* Keramik-Öfen
* Glastemperöfen
* Gasgeneratoren
* Gasbefeuchter
* Ammoniakspalter
* Gasgenerator für exothermes Gas * Gasgenerator für endothermes Gas* Methanolspalter
* MoldathermTM Heizer. * Firmenüberblick KTS.SCHLEIFTECHNOLOGIE
* Schleifmaschinen.
* Schleifmaschinen für die Automobilindustrie. * Spitzenlose Rundschleifmaschinen. * Spitzenlose Schuhschleifmaschine. * Planschleifmaschinen. * Schlitzschleifmaschine* Funkenerosion.
* Firmenüberblick KMI. * Schleifräder, Übersicht * Spitzenlos-Schleifräder * Zylindrische Schleifräder * Innenrundschleifräder* Planschleifräder
* Zahnrad-Schleifräder * Ventil-Schleifräder * Nocken-Schleifräder * Kurbelwellen-Schleifräder ÉQUIPMENT POUR TRAITEMENT DU MÉTAL ET L'INDUSTRIE AUTOMOBILE LE DURCISSEMENT DE L'ACIER ET TRAITEMENT THERMIQUE * Fours d'durcissement et malléabilisation * Fours pour traitement de l'acier.* Fours industriel
* Fours à passage
* Fours de frittage
* Fours céramiques
* Fours pour la recuisson de verre * Des générateurs de gaz * Humidificateur du gaz * Séparateur d'ammoniac * Gazogène pour la production de gaz exotherme * Gazogène pour la production de gaz endotherme * Dissociateur Méthanol * MoldathermTM éléments de chauffage. * Survol de l'entreprise. TECHNOLOGIE DES RECTIFIEUSES* Rectifieuses.
* Rectifieuses pour l'industrie automobile. * Rectifieuses sans centre, sans pointes. * Rectifieuse sans centre speciale * Rectifieuses de planage. * Rectifieuse échancrure intérieur * Électro-érosion par enfoncage. * Survol de l'entreprise KMI.* Meules, Survol
* Meules centerless
* Meules cylindrique * Meules intérieure* Meules plans
* Meules à pignon
* Meules à soupape
* Meules à cames
* Meule à vilebrequinESPANOL
ROMANA
MAGYAR
RUSSKI
ITALIANO
TRATAMIENTOS TÉRMICOS * Tratamientos térmicos de acero * Hornos de sinterización* Hornos de camaras
RECTIFICADORAS
* Rectificadoras cilíndricas sin centros * Rectificadoras planeadoras * Electroerosión para el alistamiento LIMPIADOR DE GAS DE ESCAPE * Lavador de gas de escape. CRYSTEC TECHNOLOGY TRADING GMBH * Prezentarea generala a firmei Crystec* Nota juridica
CUPTOARE
* Prelucrarea la cald a otelului * Masini pentru prelucrarea otelului. * Cuptoare industriale * Cuptoare cu trecere continua * Cuptorul de sinterizare * Cuptoare pentru producerea ceramicii * Cuptoare pentru călirea sticlei MASINI DE RECTIFICAT * Masini de rectificat fara centre * Masina de rectificat intre varfuri * Masini de rectificat plan * Masini de rectificat canalele * Eroziunea prin scanteie PIETRE DE RECTIFICAT * Prezentarea firmei si produsele oferite * Pietre de rectificat pentru masini de rectificat fara centre * Pietre de rectificat cilindrice * Pietre de rectificat interior * Pietre de rectificat pentru masini de rectificat plan * Pietre de rectificat pentru roti dintate * Pietre de rectificat scaune supape * Pietre de rectificat pentru ax cu came * Pietre de rectificat pentru arborele cotitKEMENCÉK
* Acél hokezelése
* Ipari kemencék
* Folyamatos alagútkemence * Kerámia kemence, kemencék * Szikra erózió köszörükerekek szabályzására KÖSZÖRÜLÉS TECHNOLÓGIA * Csúcs nélküli köszörügép * Electrical discharge truing CRYSTEC TECHNOLOGY TRADING GMBH * Crystec Company overview* Legal Notice
THERMAL TREATMENTS
* Thermal treatment of steel. * Furnaces for Steel Treatment. * Industrial Furnaces * Conveyor furnaces. * Sintering Furnaces * Furnaces for the ceramic industry. * Endogas generator.* Exogas generator.
* Methanol cracker.
* Ammonia cracker.
* Moldatherm® heating elementsFACTORY AUTOMATION
* AGVs , loading robotsSOLAR TECHNOLOGY
* Photovoltaic Module Manufacturing* PV-Module Factory
LCD TECHNOLOGY
* Smart Windows
* ODF-Technology
* Vacuum assembly machine * Spacer Spray Equipment EXHAUST GAS CLEANING * Company and Product Overview.* Wet scrubber
* Burn and Wet Scrubber Series. * Plasma-Scrubber and Washer * Dry Scrubber Series.GRINDING MACHINES
* Grinding Machines. * Centerless grinding machines * Shoe type centerless grinding * Surface grinding machines * Internal grove grinding * Electrical discharge truingGRINDING WHEELS
* Company and product overview * Centerless grinding wheels * Cylindrical grinding wheels * Internal round grinding wheels * Surface grinding wheels * Gear grinding wheels * Valve grinding wheels * Cam grinding wheels * Crankshaft grinding wheelsRETTIFICATRICI
* Rettificatrice senza centri * Rettificatrici per piani www.crystec.com www.crystec.euwww.crystec.at
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